INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
welcomeatinp-greifswald [punkt] de

The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

doerte [punkt] valenthinatinp-greifswald [punkt] de

Device and method for chemo-physical modification of particles of a suspension

The invention relates to a device (1) for disintegrating particles (3) of a suspension with ultrasonic sound. The device (1) comprises a channel (10) for a suspension, wherein the channel (10) comprises a particle processing portion (12). Furthermore, the device (1) comprises at least one pump (20) configured and arranged to adjust a flow velocity of the suspension in the channel (10), and at least one ultrasonic sound source (30), which is arranged such at the channel that an ultrasonic field generated by the ultrasonic sound source (30) extends at least in the particle-processing portion (12) inside the channel (10). The device (1) is configured such that particles (3) of the suspension are arrangeable in a predefined spatial particle distribution in the particle-processing portion (12) of the channel (10) by adjusting the flow velocity of the suspension with respect to an inertial force (40) acting on the suspension, wherein the inertial force (40) is gravity (42) or a centrifugal force (44).

Figure 1 of the Patent Specification

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
EPEP3603812B131.07.201827.11.2024granted
HK40014848A23.03.2020registered
CACA3099488C17.11.202023.05.2023granted
USUS11,724,215B224.11.202015.08.2023granted
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Specification