INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
welcomeatinp-greifswald [punkt] de

The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

doerte [punkt] valenthinatinp-greifswald [punkt] de

Device for plasma-supported treatment of liquids

The invention relates to a device (10) for treating a liquid with a plasma, the device (10) having a high-voltage electrode (20) and a liquid-permeable ground electrode device (30). The ground electrode device (30) has a flat, conductive area (32) and a porous area (34) arranged on the flat, conductive area (32), the conductive area (32) being liquid-permeable along its area. A discharge space (40) is formed between the ground electrode device (30) and the high-voltage electrode (20). A first dielectric (50) is arranged on the high-voltage electrode (20), so that a plasma can be generated in the discharge space (40) by means of dielectrically impeded discharge. The device (10) also has a flow volume (60) into which the liquid (12) can be introduced and which is surrounded by a wall (62). The wall (62) of the flow volume (60) has the ground electrode device (30) at least in a first area, so that the flow volume (60) is connected to the discharge space (40) via the ground electrode device (30) in a liquid-permeable manner.

Figure 1 of the Patent Specification

Main Patent Claims: 

EP3562276 B1

1. Device (10) for treatment of a liquid (12) with a nonthermal atmospheric pressure plasma, wherein the device (10) comprises the following components:
- a high-voltage electrode (20);
- a liquid-permeable ground electrode device (30) comprising an areal, conductive region (32) and a porous region (34) arranged at the areal, conductive region (32);
- a discharge space (40) formed between the ground electrode device (30) and the high-voltage electrode (20);
- a first dielectric (50) which is arranged at the high-voltage electrode (20) such that a plasma can be generated in the discharge space (40) by means of a dielectric-barrier discharge;
- a flow volume (60) comprised by a wall (62) into which the liquid (12) can be fed;
wherein the wall (62) of the flow volume (60) comprises at least in a first region the ground electrode device (30), such that the flow volume (60) is connected liquid-permeably to the discharge space (40) via the ground electrode device (30);
wherein the device (10) is formed such that, in use, the liquid fed into the flow volume (60) passes through the ground electrode device and pours onto a surface of the ground electrode device (30) that faces the discharge space (40), so that a liquid film is formed on said surface;
characterized in that
the conductive region (32) of the ground electrode device is liquid-permeable along its areal expansion.

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
EPEP3562276B123.04.201830.12.2020granted (in force in Germany, France, Belgium, Switzerland, Austria, Poland, Netherlands, Italy, Spain, Latvia, Lithuania, Estonia)
USUS10/995,018B223.04.201904.05.2021granted
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Application
Plasma Source Specification