The invention relates to a system (1) for generating and controlling a non-thermal atmospheric pressure plasma, comprising: - a discharge space (10) into which a working gas can be introduced via a first opening (12), wherein a plasma (5) can be generated in the discharge space (10), wherein the discharge space (10) has a second opening (14), so that the plasma (5, 6) can exit from the discharge space (10) through this second opening (14) and - at least one high-voltage electrode (20) for generating an electromagnetic field for generating a plasma (5) in the discharge space (10). The plasma (5, 6) exiting through the second opening (14) is controlled by a throughflow controller (40) of the system (1), which throughflow controller (40) is designed to adjust a volume flow (60) of the working gas through the first opening (12) from a working gas source (50) into the discharge space (10). In this case, the throughflow controller (40) is further designed to assume at least a first state and a second state, wherein in the first state no working gas is supplied from the working gas source (50) to the discharge space (10), so that no plasma (5) exits from the second opening (14) even when there is a generated electromagnetic field in the discharge space (10), and wherein in the second state the working gas is supplied from the working gas source (50) to the discharge space (10), a plasma (5) is generated in the discharge space (10) and the plasma (5, 6) exits from the second opening (14).
Figure 1 of the Patent Specification
US12,239,843 B2
1. System (1) for generating and controlling a non-thermal atmospheric pressure plasma, wherein the system (1) comprising:
- a plurality of discharge spaces (10, 10a, 10b, 10c), wherein each discharge space (10, 10a, 10b, 10e) has:
- a respective first opening (12, 12a, 12b, 12c) capable of introducing a working gas into the respective discharge space (10, 10a, 10b, 10c),
- an assigned second opening (14, 14a, 14b, 14c) through which the plasma can exit the respective discharge space (10, 10a, 10b, 10c),
- at least one high-voltage electrode (20, 20a, 20b, 20c) for generating an electromagnetic field for generating a plasma (5) in the respective discharge
space (10, 10a, 10b, 10e), so that in each discharge space (10, 10a, 10b, 10c), independently of the other discharge spaces (10, 10a, 10b, 10c), a plasma (5)
is generatable,
- a plurality of flow controllers (40, 40a, 40b, 40c), each flow controller (40, 40a, 40b, 40c) being assigned to a respective discharge space (10, 10a, 10b, 10c) for
controlling the plasma (5,6) exiting through the assigned second opening (14, 14a, 14b, 14c), wherein each flow controller (40, 40a, 40b, 40c) is formed to:
- set a volume flow (60) of the working gas through the respective first opening (12, 12a, 12b, 12c) of the respective discharge space (10, 10a, 10b, 10c)
from a working gas source (50, 50a, 50b) into the respective discharge space (10, 10a, 10b, 10c), and
- to adopt at least a first state and a second state, wherein in the first state no working gas from the working gas source (50, 50a, 50b) is supplied to the
respective discharge space (10, 10a, 10b, 10c), so that in the respective discharge space (10, 10a, 10b, 10c), even with generated electromagnetic field in
the respective discharge space (10, 10a, 10b, 10c), no plasma (5) exits from assigned second opening (14, 14a, 14b, 14c), and wherein in the second state
the working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10c) and a plasma (5) is generated
there, and the plasma (5, 6) exits from the assigned second opening (14, 14a, 14b, 14c),
characterized in that the system (1) is configured to generate at least one of a capacitively-coupled, an inductively-coupled and a microwave-induced plasma in the working gas supplied through the first opening.
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