etching

AURA-WAVE (Sairem)

AURA-WAVE is an Electron Cyclotron Resonance (ECR) coaxial plasma source. It has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure due to Electron Cyclotron Resonance. AURA-WAVE microwave plasma source has been designed to sustain microwave plasma over several decades of pressure, i.e. from 10⁻⁴ mbar to a few 10⁻² mbar and from a few watts depending on the gas.

Device and method for generating a pulsed anisothermal atmospheric pressure plasma

The invention relates to a device and a method for generating a pulsed (intermittent), cold, atmospheric pressure plasma, preferably a thread, for precise antimicrobial plasma treatment (disinfection, disinfection, sterilization, decontamination) of the smallest areas and cavities, even on living human beings and animal bodies, preferably in the field of medicine, by means of a negative direct current corona discharge with at least one electrode for generating high field strengths, which the gas to be ionized flows through or around in a gas channel, the counter electrode being the electric

On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes

The temporal behavior of the molecular etching product SiF4 in fluorocarbon-based plasmas used for the dry etching of ultra low-k (ULK) materials has been brought into connection with the polymer deposition on the surface during plasma treatment within the scope of this work. For this purpose, the density of SiF4 has been measured time-resolved using quantum cascade laser absorption spectroscopy (QCLAS).